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By 1989, the Group diversified into the quartz crystal manufacturing and trading and Hong Kong X'tals Ltd was formed in 1991. The global brand "HKC" has since gained wide recognition in global automotive, electronic networking and industrial/consumer electronic appliances industries.

A quartz crystal also has reactance, though this reactance is a bit complicated because of the interaction between the three reactive components. ... Each unit is individually calibrated to the correct frequency using high vacuum deposition equipment and ion beam etching machines. Using these techniques, crystals can be manufactured to +/-10ppm ...

May 12, 2014· crystal cutting and engraving by laser cutting and engraving machine. ... Perfectlaser China 136,746 views. 6:11.

Etch rates in Z-cut quartz; experiments and simulation Figure 1. Schematic drawings of a right-handed -quartz crystal (a) and its projection on the XY-plane (b). The three X-axes in the figure show the trigonal symmetry. Only one of the Y-axes is shown in the figure. The letters R, r, m, x and sdenote the natural main crystal planes in quartz ...

The depth of wet-etched quartz can reach 500 μm [11], but because of the anisotropy of quartz, the sidewall crystal edges can only be reduced through continuous experiments, and cannot be ...

The etching of the quartz and the Suprasil 2 and Herasil 2 glasses was consistent with a process of ion-enhanced chemical reaction as identified by Steinbruchel. For these substrates, the etch rate was directly dependent on the square root of bias voltage in the RIE and .

m-quartz - 1L single crystal aligned 500-1000 This work Acid etching - 1L single crystal not aligned 50-1100 Nanoscale Horiz., 2019, 4, 689-696 RIE etching Prepatterning >1L polycrystal aligned ~1000 Adv. Funct. Mater. 2018, 1704863 Vapor-liquid-solid growth with NaCl - 1L single crystal not aligned ~2000 Nat. Mater. 17.6 (2018): 535.

Ferrotec provides customers with advanced technology solutions that make their products work better, more precisely, and more reliably. Founded in 1980 on a technology core of FerroFluid magnetic liquid and Ferrofluidic® sealing products, our company and our product portfolio have grown to meet the evolving needs of our customers.

II. Design and Methods. PMN-PT single crystals were supplied by HC Materials Corps (Urbana, IL). The properties of the samples are shown in Table I.The 1–3 composite was fabricated using a novel etch-and-fill technique according to the PC-MUT fabrication process [].The fabrication process is shown in Fig. 1.PMN-PT wafers were lapped on both sides and polished on one side.

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Aug 06, 2019· Typical materials that can be etched include glass, alumina, quartz, crystals, silica, agates, porcelain, cermets. and numerous metals and oxides. Advantages. Ion-beam has many advantages which include: The process is almost universal. No chemical reagents or etching .

and etching rate increased with HF concentration, and the transition between various planes can be described by an interaction of adjacent natural crystal planes. Danel et al. [17] realized an acceleration sensor and described the chemical etching of quartz crystals. They gave the etch rates of X, Y, and

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Dec 01, 1999· For quartz, Suprasil 2 and Herasil 2, the etch rate was dependent on the square root of bias voltage and on the CHF 3 /CF 4 ratio, indicative of a process of ion-enhanced chemical etching. For the LE, NA and soda-lime glasses, the etch rates were equivalent in both the CHF 3 /CF 4 and Ar plasmas indicating a process of sputter etching.

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Reticle employs a selection of gridded RF-ICP ion sources for high energy deposition. Available sources include 4, 10, 14, and 22 cm grid configurations with ion energies up to 1200 eV and beam currents greater than 1000 mA. Self-aligned ion optics are configured specifically for the desired deposition requirements and geometry of your process.

This paper demonstrates the wet etching effects on machined surface of single crystal Si. The machined surface was prepared by irradiating sample with low energy (~ 2keV) ECR sourced Ar + ion beam. Then we performed etching process by HF(2.4%) at 20min,40min and 60min respectively.

In this work, high-frequency one-chip multichannel quartz crystal microbalance (QCM) prepared by deep reactive ion etching (RIE) is presented. The quartz resonators in one-chip with the diameter ...

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etchant. It may find use as a hard mask for plasma etching due to its low etch rate, and as a dry lubricant in MEMS. B. Silicon Dioxide Fused Quartz Wafer: Wafers of General Electric 124 or NSG N fused quartz source material, % silicon dioxide, with amorphous structure (as opposed to true crystalline quartz). This material is commonly referred ...

The etching time of fused quartz and LiNbO 3 are 1.5 h and 4 h, respectively, and the groove depth of these two samples is ∼ 0.7 μm and ∼ 1.3 μm, respectively. During the ion beam etching process, the facets are formed in the sidewalls of samples and photoresist.

The equipment that is built in house including sealing equipment, ion-etching frequency adjustment machines, conventional frequency adjustment equipment, automatic crystal/oscillator test equipment, TC test machines and 3 in 1 robotic for auto equipment testing, laser marking and taping.

Aug 11, 2016· The etching of the quartz crystal was carried out using KOH concentration of 25 %, 30% and 35 % by weight at a temperature of 80°C for 2 hours. Aurum palladium (AuPd) was used as a mask to protect the rest of the quartz crystal. The AuPd mask was coated on the quartz crystal by a sputter coater in a high vacuum chamber.

Ferrotec provides customers with advanced technology solutions that make their products work better, more precisely, and more reliably. Founded in 1980 on a technology core of FerroFluid magnetic liquid and Ferrofluidic® sealing products, our company and our product portfolio have grown to meet the evolving needs of our customers.
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